Abstract
We report on the characteristics of reduced graphene oxide (rGO)/GaN Schottky diodes in which the reduction process is performed at various temperatures. The Schottky barrier height of the rGO/GaN Schottky diode peaks at 1.07 eV with the reduction temperature of 650 °C, caused by changes in the O-containing functional groups and surface Fermi-level pinning during thermal reduction. The interdigitated rGO/GaN metal–semiconductor–metal photodiode using GO reduced at 650 °C exhibits a responsivity of 0.128 A/W under 365-nm illumination, with a sharp cutoff near the GaN energy bandgap.
| Original language | English |
|---|---|
| Pages (from-to) | 824-827 |
| Number of pages | 4 |
| Journal | Thin Solid Films |
| Volume | 660 |
| DOIs | |
| State | Published - 2018.08.30 |
Keywords
- Gallium nitride
- Graphene oxide
- Metal-semiconductor-metal photodiode
- Schottky barrier height
Quacquarelli Symonds(QS) Subject Topics
- Materials Science
- Physics & Astronomy
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