Metal–semiconductor–metal ultraviolet photodiodes based on reduced graphene oxide/GaN Schottky contacts

  • Bhishma Pandit
  • , Jaehee Cho*
  • *Corresponding author for this work

Research output: Contribution to journalJournal articlepeer-review

Abstract

We report on the characteristics of reduced graphene oxide (rGO)/GaN Schottky diodes in which the reduction process is performed at various temperatures. The Schottky barrier height of the rGO/GaN Schottky diode peaks at 1.07 eV with the reduction temperature of 650 °C, caused by changes in the O-containing functional groups and surface Fermi-level pinning during thermal reduction. The interdigitated rGO/GaN metal–semiconductor–metal photodiode using GO reduced at 650 °C exhibits a responsivity of 0.128 A/W under 365-nm illumination, with a sharp cutoff near the GaN energy bandgap.

Original languageEnglish
Pages (from-to)824-827
Number of pages4
JournalThin Solid Films
Volume660
DOIs
StatePublished - 2018.08.30

Keywords

  • Gallium nitride
  • Graphene oxide
  • Metal-semiconductor-metal photodiode
  • Schottky barrier height

Quacquarelli Symonds(QS) Subject Topics

  • Materials Science
  • Physics & Astronomy

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