Nanoscale chemical and structural reconstruction in thermally oxidized TiN/SnO2 ultrathin films

Ahmed Yousef Mohamed; Dae Hyun Kim; Minji Lee; Tae Joo Park; Deok Yong Cho

doi:10.1016/j.jallcom.2020.155896

Nanoscale chemical and structural reconstruction in thermally oxidized TiN/SnO₂ ultrathin films

Ahmed Yousef Mohamed
, Dae Hyun Kim
, Minji Lee
, Tae Joo Park^*
, Deok Yong Cho^*

^*Corresponding author for this work

Department of Physics

Research output: Contribution to journal › Journal article › peer-review

1 Scopus citations

Abstract

The chemical and nanostructural changes of TiN/SnO₂ composite films during post-deposition annealing (PDA) was investigated by scanning electron microscopy, transmission electron microscopy, and X-ray absorption spectroscopy. It was found that during annealing in an oxygen-rich environment, TiN is converted to TiO₂ and diffuses into the SnO₂ region along grain boundaries to form a SnO₂/TiO₂ oxide nanocomposite. In addition, rupture of the Si substrate in contact with the nanocomposite was clearly observed. The nanostructural changes and rupture of the Si surface were found to depend on the oxygen partial pressure during PDA, indicating that thermal oxidation can induce abrupt chemical and structural reconstruction in the composite films.

Original language	English
Article number	155896
Journal	Journal of Alloys and Compounds
Volume	843
DOIs	https://doi.org/10.1016/j.jallcom.2020.155896
State	Published - 2020.11.30

Keywords

Microscopy
Nanocomposite
Post-deposition annealing
SnO
TiO
X-ray absorption spectroscopy

Quacquarelli Symonds(QS) Subject Topics

Materials Science
Engineering - Mechanical

Access to Document

10.1016/j.jallcom.2020.155896

Cite this

@article{93ff884373094db8b9743067054cc24c,

title = "Nanoscale chemical and structural reconstruction in thermally oxidized TiN/SnO2 ultrathin films",

abstract = "The chemical and nanostructural changes of TiN/SnO2 composite films during post-deposition annealing (PDA) was investigated by scanning electron microscopy, transmission electron microscopy, and X-ray absorption spectroscopy. It was found that during annealing in an oxygen-rich environment, TiN is converted to TiO2 and diffuses into the SnO2 region along grain boundaries to form a SnO2/TiO2 oxide nanocomposite. In addition, rupture of the Si substrate in contact with the nanocomposite was clearly observed. The nanostructural changes and rupture of the Si surface were found to depend on the oxygen partial pressure during PDA, indicating that thermal oxidation can induce abrupt chemical and structural reconstruction in the composite films.",

keywords = "Microscopy, Nanocomposite, Post-deposition annealing, SnO, TiO, X-ray absorption spectroscopy",

author = "Mohamed, \{Ahmed Yousef\} and Kim, \{Dae Hyun\} and Minji Lee and Park, \{Tae Joo\} and Cho, \{Deok Yong\}",

note = "Publisher Copyright: {\textcopyright} 2020 Elsevier B.V.",

year = "2020",

month = nov,

day = "30",

doi = "10.1016/j.jallcom.2020.155896",

language = "English",

volume = "843",

journal = "Journal of Alloys and Compounds",

issn = "0925-8388",

}

TY - JOUR

T1 - Nanoscale chemical and structural reconstruction in thermally oxidized TiN/SnO2 ultrathin films

AU - Mohamed, Ahmed Yousef

AU - Kim, Dae Hyun

AU - Lee, Minji

AU - Park, Tae Joo

AU - Cho, Deok Yong

PY - 2020/11/30

Y1 - 2020/11/30

N2 - The chemical and nanostructural changes of TiN/SnO2 composite films during post-deposition annealing (PDA) was investigated by scanning electron microscopy, transmission electron microscopy, and X-ray absorption spectroscopy. It was found that during annealing in an oxygen-rich environment, TiN is converted to TiO2 and diffuses into the SnO2 region along grain boundaries to form a SnO2/TiO2 oxide nanocomposite. In addition, rupture of the Si substrate in contact with the nanocomposite was clearly observed. The nanostructural changes and rupture of the Si surface were found to depend on the oxygen partial pressure during PDA, indicating that thermal oxidation can induce abrupt chemical and structural reconstruction in the composite films.

AB - The chemical and nanostructural changes of TiN/SnO2 composite films during post-deposition annealing (PDA) was investigated by scanning electron microscopy, transmission electron microscopy, and X-ray absorption spectroscopy. It was found that during annealing in an oxygen-rich environment, TiN is converted to TiO2 and diffuses into the SnO2 region along grain boundaries to form a SnO2/TiO2 oxide nanocomposite. In addition, rupture of the Si substrate in contact with the nanocomposite was clearly observed. The nanostructural changes and rupture of the Si surface were found to depend on the oxygen partial pressure during PDA, indicating that thermal oxidation can induce abrupt chemical and structural reconstruction in the composite films.

KW - Microscopy

KW - Nanocomposite

KW - Post-deposition annealing

KW - SnO

KW - TiO

KW - X-ray absorption spectroscopy

UR - https://www.scopus.com/pages/publications/85087116997

U2 - 10.1016/j.jallcom.2020.155896

DO - 10.1016/j.jallcom.2020.155896

M3 - Journal article

AN - SCOPUS:85087116997

SN - 0925-8388

VL - 843

JO - Journal of Alloys and Compounds

JF - Journal of Alloys and Compounds

M1 - 155896

ER -