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Optical properties of the InAs/InAlGaAs quantum dots subjected to thermal treatments

  • Byounggu Jo
  • , Jaesu Kim
  • , Kwang Jae Lee
  • , Hyunjune Kim
  • , Dongwoo Park
  • , Cheul Ro Lee
  • , Jin Soo Kim
  • , Sung Bum Bae
  • , Won Seok Han
  • , Dae Kon Oh
  • , Jae Young Leem
  • , Jong Su Kim
  • , Sang Jun Lee
  • , Sam Kyu Noh
  • Jeonbuk National University
  • Electronics and Telecommunications Research Institute
  • Inje University
  • Yeungnam University
  • Korea Research Institute of Standards and Science

Research output: Contribution to journalJournal articlepeer-review

Abstract

The inter-diffusion kinetics of group-III elements at the interface between self-assembled InAs quantum dots (QDs) and InAlGaAs barriers were investigated indirectly by post-growth annealing treatments and photoluminescence (PL) spectroscopy. The emission wavelength of the InAs/InAlGaAs QDs subjected to thermal annealing at 550 °C was 1444 nm at 10 K, which indicated a 57 nm red shift compared to the as-grown sample (1387 nm). The emission wavelength was blue-shifted with further increases in annealing temperature to 650 °C. Although there was a blue shift in the emission wavelength at an annealing temperature of 600 and 650 °C, the emission peak was still longer than that of the as-grown sample. These results were explained by the difference in inter-diffusion probability between group-III elements at the interface between the InAs QDs and InAlGaAs barrier.

Original languageEnglish
Pages (from-to)6429-6431
Number of pages3
JournalThin Solid Films
Volume518
Issue number22
DOIs
StatePublished - 2010.09.1

Keywords

  • Inter-diffusion
  • Optical properties
  • Post-growth annealing
  • Quantum dot

Quacquarelli Symonds(QS) Subject Topics

  • Materials Science
  • Physics & Astronomy

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