Patterning of an amine-terminated nanolayer by extreme ultraviolet

The adsorption of N H3 molecules on the Si (100) 2×1 surface constructs a cleaner and more well-defined amine layer than self-assembled monolayer such as aminosilylated layer, which make it possible to study photoinduced reactions between amines and monochromatic light with shorter wavelength than ultraviolet, i.e., extreme ultraviolet and soft x ray. We report that the molecular layer of amine groups reacts with extreme ultraviolet and soft x ray, which can be used to make fine patterns on the amine-terminated layer. The amine patterning with the leading postoptical lithography using extreme ultraviolet could be applied to fabricating future molecular nanodevices.