Perfluorocarbon destruction and removal efficiency: Considering the byproducts and energy consumption of an abatement system for microelectronics manufacturing

Dong Guk Ko; Seung Jong Ko; Eun Kyung Choi; Sang Guen Min; Sang Hyub Oh; Jinsang Jung; Byung Moon Kim; Ik Tae Im

doi:10.1109/TSM.2014.2362942

Perfluorocarbon destruction and removal efficiency: Considering the byproducts and energy consumption of an abatement system for microelectronics manufacturing

Dong Guk Ko
, Seung Jong Ko
, Eun Kyung Choi
, Sang Guen Min
, Sang Hyub Oh
, Jinsang Jung
, Byung Moon Kim
, Ik Tae Im^*

^*Corresponding author for this work

Mechanical Design Engineering

Jeonbuk National University
SK Corporation
Korea Research Institute of Standards and Science

Research output: Contribution to journal › Journal article › peer-review

7 Scopus citations

Abstract

The purpose of this paper was to estimate the reduction efficiency of an abatement system for perfluorocarbon (PFC) gases produced during semiconductor manufacturing processes. The reduction efficiency currently used in the semiconductor industry, the destruction and removal efficiency (DRE), considers only the destruction ratio of PFC gases. A method estimating the reduction efficiency, which in addition to measure the destruction ratio also considers the energy consumption and byproducts produced during the treatment of PFC gases, was proposed in this paper; this efficiency was defined as the net reduction efficiency (NRE). For the estimation of the reduction efficiency, measurements were made using a plasma-wet type abatement system installed in an actual semiconductor manufacturing plant. The destruction ratio of the PFC gases was measured using Fourier transform infrared spectroscopy and quadrupole mass spectroscopy. The energy consumption was measured using an electricity meter. Based on these measurements, the DRE and the NRE of the PFC gases were calculated and compared. The results indicated that the DRE showed high reduction efficiency while the NRE showed lower values.

Original language	English
Article number	6922573
Pages (from-to)	456-461
Number of pages	6
Journal	IEEE Transactions on Semiconductor Manufacturing
Volume	27
Issue number	4
DOIs	https://doi.org/10.1109/TSM.2014.2362942
State	Published - 2014.11.1

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Keywords

Emission
infrared spectroscopy
mass spectroscopy

Quacquarelli Symonds(QS) Subject Topics

Engineering - Mechanical
Materials Science
Engineering - Electrical & Electronic
Engineering - Petroleum
Physics & Astronomy

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10.1109/TSM.2014.2362942

Cite this

Ko, D. G., Ko, S. J., Choi, E. K., Min, S. G., Oh, S. H., Jung, J., Kim, B. M., & Im, I. T. (2014). Perfluorocarbon destruction and removal efficiency: Considering the byproducts and energy consumption of an abatement system for microelectronics manufacturing. IEEE Transactions on Semiconductor Manufacturing, 27(4), 456-461. Article 6922573. https://doi.org/10.1109/TSM.2014.2362942

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title = "Perfluorocarbon destruction and removal efficiency: Considering the byproducts and energy consumption of an abatement system for microelectronics manufacturing",

abstract = "The purpose of this paper was to estimate the reduction efficiency of an abatement system for perfluorocarbon (PFC) gases produced during semiconductor manufacturing processes. The reduction efficiency currently used in the semiconductor industry, the destruction and removal efficiency (DRE), considers only the destruction ratio of PFC gases. A method estimating the reduction efficiency, which in addition to measure the destruction ratio also considers the energy consumption and byproducts produced during the treatment of PFC gases, was proposed in this paper; this efficiency was defined as the net reduction efficiency (NRE). For the estimation of the reduction efficiency, measurements were made using a plasma-wet type abatement system installed in an actual semiconductor manufacturing plant. The destruction ratio of the PFC gases was measured using Fourier transform infrared spectroscopy and quadrupole mass spectroscopy. The energy consumption was measured using an electricity meter. Based on these measurements, the DRE and the NRE of the PFC gases were calculated and compared. The results indicated that the DRE showed high reduction efficiency while the NRE showed lower values.",

keywords = "Emission, infrared spectroscopy, mass spectroscopy",

author = "Ko, \{Dong Guk\} and Ko, \{Seung Jong\} and Choi, \{Eun Kyung\} and Min, \{Sang Guen\} and Oh, \{Sang Hyub\} and Jinsang Jung and Kim, \{Byung Moon\} and Im, \{Ik Tae\}",

note = "Publisher Copyright: {\textcopyright} 2014 IEEE.",

year = "2014",

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doi = "10.1109/TSM.2014.2362942",

language = "English",

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Perfluorocarbon destruction and removal efficiency: Considering the byproducts and energy consumption of an abatement system for microelectronics manufacturing. / Ko, Dong Guk; Ko, Seung Jong; Choi, Eun Kyung et al.
In: IEEE Transactions on Semiconductor Manufacturing, Vol. 27, No. 4, 6922573, 01.11.2014, p. 456-461.

Research output: Contribution to journal › Journal article › peer-review

TY - JOUR

T1 - Perfluorocarbon destruction and removal efficiency

T2 - Considering the byproducts and energy consumption of an abatement system for microelectronics manufacturing

AU - Ko, Dong Guk

AU - Ko, Seung Jong

AU - Choi, Eun Kyung

AU - Min, Sang Guen

AU - Oh, Sang Hyub

AU - Jung, Jinsang

AU - Kim, Byung Moon

AU - Im, Ik Tae

PY - 2014/11/1

Y1 - 2014/11/1

N2 - The purpose of this paper was to estimate the reduction efficiency of an abatement system for perfluorocarbon (PFC) gases produced during semiconductor manufacturing processes. The reduction efficiency currently used in the semiconductor industry, the destruction and removal efficiency (DRE), considers only the destruction ratio of PFC gases. A method estimating the reduction efficiency, which in addition to measure the destruction ratio also considers the energy consumption and byproducts produced during the treatment of PFC gases, was proposed in this paper; this efficiency was defined as the net reduction efficiency (NRE). For the estimation of the reduction efficiency, measurements were made using a plasma-wet type abatement system installed in an actual semiconductor manufacturing plant. The destruction ratio of the PFC gases was measured using Fourier transform infrared spectroscopy and quadrupole mass spectroscopy. The energy consumption was measured using an electricity meter. Based on these measurements, the DRE and the NRE of the PFC gases were calculated and compared. The results indicated that the DRE showed high reduction efficiency while the NRE showed lower values.

AB - The purpose of this paper was to estimate the reduction efficiency of an abatement system for perfluorocarbon (PFC) gases produced during semiconductor manufacturing processes. The reduction efficiency currently used in the semiconductor industry, the destruction and removal efficiency (DRE), considers only the destruction ratio of PFC gases. A method estimating the reduction efficiency, which in addition to measure the destruction ratio also considers the energy consumption and byproducts produced during the treatment of PFC gases, was proposed in this paper; this efficiency was defined as the net reduction efficiency (NRE). For the estimation of the reduction efficiency, measurements were made using a plasma-wet type abatement system installed in an actual semiconductor manufacturing plant. The destruction ratio of the PFC gases was measured using Fourier transform infrared spectroscopy and quadrupole mass spectroscopy. The energy consumption was measured using an electricity meter. Based on these measurements, the DRE and the NRE of the PFC gases were calculated and compared. The results indicated that the DRE showed high reduction efficiency while the NRE showed lower values.

KW - Emission

KW - infrared spectroscopy

KW - mass spectroscopy

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M3 - Journal article

AN - SCOPUS:84911214737

SN - 0894-6507

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JF - IEEE Transactions on Semiconductor Manufacturing

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ER -

Perfluorocarbon destruction and removal efficiency: Considering the byproducts and energy consumption of an abatement system for microelectronics manufacturing

Abstract

UN SDGs

Keywords

Quacquarelli Symonds(QS) Subject Topics

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