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Performance improvement of InGaN-based laser diodes by epitaxial layer structure design

  • Jianping Liu*
  • , Yun Zhang
  • , Zachary Lochner
  • , Seong Soo Kim
  • , Hyunsoo Kim
  • , Jae Hyun Ryou
  • , Shyh Chiang Shen
  • , P. Doug Yoder
  • , Russell D. Dupuis
  • , Qiyuan Wei
  • , Kewei Sun
  • , Alec Fischer
  • , Fernando Ponce
  • *Corresponding author for this work

Research output: Contribution to conferenceConference paperpeer-review

Abstract

Blue laser diode (LD) structures with GaN waveguide layers and with In 0.03Ga0.97N waveguide layers were grown. A comparison study showed In0.03Ga0.97N waveguide layers significantly enhance the LD performance. The mechanism behind this was investigated using reciprocal space mapping of X-ray diffraction and time-resolved cathodoluminescence measurements. Room-temperature lasing of laser diodes at 454.6 nm was realized for LD structure with In0.03Ga0.97N waveguide layers.

Original languageEnglish
Title of host publicationGallium Nitride Materials and Devices V
DOIs
StatePublished - 2010
EventGallium Nitride Materials and Devices V - San Francisco, CA, United States
Duration: 2010.01.252010.01.28

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7602
ISSN (Print)0277-786X

Conference

ConferenceGallium Nitride Materials and Devices V
Country/TerritoryUnited States
CitySan Francisco, CA
Period10.01.2510.01.28

Keywords

  • InGaN waveguide layers
  • Laser diodes
  • Metalorganic chemical vapor deposition

Quacquarelli Symonds(QS) Subject Topics

  • Materials Science
  • Computer Science & Information Systems
  • Mathematics
  • Engineering - Electrical & Electronic
  • Engineering - Petroleum
  • Data Science
  • Physics & Astronomy

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