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Photocurrent of Si0.8Ge0.2/Si strained multiple quantum-wells grown by using UHV-CVD

  • T. S. Kim
  • , S. S. Choi
  • , T. S. Jeong
  • , S. Kang
  • , K. H. Shim
  • Jeonbuk National University

Research output: Contribution to conferenceConference paperpeer-review

Abstract

The optical property was studied for the Si0.8Ge 0.2/Si strained multiple quantum-well (MQW) structure grown by using ultra high vacuum chemical vapor deposition (UHV-CVD). The structural properties of the Si0.8Ge0.2/Si strained MQW were investigated using high-resolution X-ray diffraction (HR-XRD). The photocurrent spectrum of a Si0.8Ge0.2/Si strained MQW was measured at the room-temperature and the liquid-nitrogen temperature. For Si 0.8Ge0.2/Si strained MQW, the transition peaks related to the MQW region observed in the photocurrent spectrum were preliminarily assigned to electron-heavy hole (e-hh) and electron-light hole (e-lh) fundamental excitionic transitions.

Original languageEnglish
Title of host publicationECS Transactions - SiGe, Ge, and Related Compounds 3
Subtitle of host publicationMaterials, Processing, and Devices
PublisherElectrochemical Society Inc.
Pages875-880
Number of pages6
Edition10
ISBN (Print)9781566776561
DOIs
StatePublished - 2009
Event3rd SiGe, Ge, and Related Compounds: Materials, Processing and Devices Symposium - 214th ECS Meeting - Honolulu, HI, United States
Duration: 2008.10.122008.10.17

Publication series

NameECS Transactions
Number10
Volume16
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

Conference3rd SiGe, Ge, and Related Compounds: Materials, Processing and Devices Symposium - 214th ECS Meeting
Country/TerritoryUnited States
CityHonolulu, HI
Period08.10.1208.10.17

Quacquarelli Symonds(QS) Subject Topics

  • Engineering & Technology

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