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Photoluminescence studies of Mg-doped AlxGa1-xAs epitaxial layers grown by molecular beam epitaxy

  • Min Su Kim
  • , Do Yeob Kim
  • , Ho Jin Park
  • , Jong Su Kim
  • , Jin Soo Kim
  • , Dong Yul Lee
  • , Jeong Sik Son
  • , Jae Young Leem*
  • *Corresponding author for this work
  • Inje University
  • Gwangju Institute of Science and Technology
  • Samsung
  • Kyungwoon University

Research output: Contribution to journalJournal articlepeer-review

Abstract

Magnesium (Mg)-doped AlxGa1-xAs epitaxial layers were grown by molecular beam epitaxy (MBE) at various substrate temperatures, Al mole fractions, and As/Ga beam equivalent pressure (BEP) ratios. The optical properties were investigated by photoluminescence (PL) spectroscopy. The PL emission peak intensity was increased and the emission peak was slightly blue shifted from 700.7 to 697.3nm when the substrate temperature was increased. The full width at half maximum (FWHM) was decreased from 29.6 to 19meV when the substrate temperature was increased. The other growth parameters, such as the As/Ga BEP ratio and the Al mole fraction, also affected the optical properties of the Mg-doped AlxGa1-xAs epilayers. The anomalous behavior of the blue- and red-shift of the PL peak energy was observed also to be temperature dependent.

Original languageEnglish
Article number041103
JournalJapanese Journal of Applied Physics
Volume48
Issue number4
DOIs
StatePublished - 2009.04

Quacquarelli Symonds(QS) Subject Topics

  • Physics & Astronomy

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