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Pixel structure for higher optical efficiency in the patterned vertical alignment LC mode

  • Byung Wok Park*
  • , Eun Young Jeon
  • , Ki Han Kim
  • , Dong Han Song
  • , Ji Hoon Lee
  • , Gak Seok Lee
  • , Ki Chul Shin
  • , Hee Seop Kim
  • , Tae Hoon Yoon
  • *Corresponding author for this work
  • Pusan National University
  • Samsung

Research output: Contribution to conferenceConference paperpeer-review

Abstract

In this paper, we propose new pixel structures for high transmittance in the patterned vertical alignment mode. We formed the protrusion or the slit on the top substrate to reduce the width of disclination lines at the domain boundaries.

Original languageEnglish
Title of host publicationAdvances in Display Technologies II
DOIs
StatePublished - 2012
EventAdvances in Display Technologies II - San Francisco, CA, United States
Duration: 2012.01.252012.01.26

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8280
ISSN (Print)0277-786X

Conference

ConferenceAdvances in Display Technologies II
Country/TerritoryUnited States
CitySan Francisco, CA
Period12.01.2512.01.26

Keywords

  • disclination line
  • high transmittance
  • liquid crystal display
  • micro-slit
  • patterned VA mode
  • protrusion

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