Plasma enhanced chemical vapor deposition of palladium in anodic aluminum oxide template

High quality AAO templates were fabricated using multi-step electrochemical process. The formation of well ordered pores having dimensions of 50-100 nm diameters and up to 2000 nm depths, could be achieved. The effect of processing time, voltage during anodization, etc. have been studied. The freshly fabricated AAO templates are used to deposit palladium films using RF-plasma chemical vapor deposition using palladium hexafluro-acetylacetonate [Pd(C₅HF₆O₂)₂], as a precursor material. The samples were characterized by using high resolution scanning electron microscopy (SEM), energy dispersive X-ray analysis (EDX), glancing angle X-ray diffraction etc. It is observed that the conformal coatings of palladium could be achieved in AAO pores, which could subsequently be utilized for many applications where in catalytic behavior of palladium is utilized.