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Polymer Interfacial Self-Assembly Guided Two-Dimensional Engineering of Hierarchically Porous Carbon Nanosheets

  • Seongseop Kim
  • , Mieun Ju
  • , Jisung Lee
  • , Jongkook Hwang*
  • , Jinwoo Lee*
  • *Corresponding author for this work
  • Korea Advanced Institute of Science and Technology
  • Pohang University of Science and Technology

Research output: Contribution to journalJournal articlepeer-review

Abstract

Two-dimensional (2D) carbon nanosheets with micro- and/or mesopores have attracted great attention due to unique physical and chemical properties, but well-defined nanoporous carbon nanosheets with tunable thickness and pore size have been rarely realized. Here, we develop a polymer-polymer interfacial self-assembly strategy to achieve hierarchically porous carbon nanosheets (HNCNSs) by integrating the migration behaviors of immiscible ternary polymers with block copolymer (BCP)-directed self-assembly. The balanced interfacial compatibility of BCP allows the migration of a BCP-rich phase to the interface between two immiscible homopolymer major phases (i.e., homopoly(methyl methacrylate) and homopolystyrene), where the BCP-rich phase spreads thinly to a thickness of a few nanometers to decrease the interfacial tension. BCP-directed coassembly with organic-inorganic precursors constructs an ordered mesostructure. Carbonization and chemical etching yield ultrathin HNCNSs with hierarchical micropores and mesopores. This approach enables facile control over the thickness (5.6-75 nm) and mesopore size (25-46 nm). As an anode material in a potassium ion battery, HNCNSs show high specific capacity (178 mA h g-1 at a current density of 1 A g-1) with excellent long-term stability (2000 cycles), by exploiting the advantages of the hierarchical pores and 2D nanosheet morphology (efficient ion/electron diffusion) and of the large interlayer spacing (stable ion insertion).

Original languageEnglish
Pages (from-to)9250-9257
Number of pages8
JournalJournal of the American Chemical Society
Volume142
Issue number20
DOIs
StatePublished - 2020.05.20

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