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Post-annealing effect on the electronic structure of Mn atoms in Ga 1-xMnxAs probed by resonant inelastic x-ray scattering

  • G. S. Chang*
  • , E. Z. Kurmaev
  • , L. D. Finkelstein
  • , H. K. Choi
  • , W. O. Lee
  • , Y. D. Park
  • , T. M. Pedersen
  • , A. Moewes
  • *Corresponding author for this work
  • University of Saskatchewan
  • Institute of Metal Physics
  • Seoul National University

Research output: Contribution to journalJournal articlepeer-review

Abstract

The electronic structure of as-grown and post-annealed Ga 1-xMnxAs epilayers (x≈0.055) has been investigated using resonant inelastic x-ray scattering. Mn L2,3 x-ray emission spectra show that the integral intensity ratio of Mn L2 to L 3 emission lines increases with annealing temperature and comes close to that of manganese oxide. The oxygen K-emission/absorption spectra of post-annealed Ga0.945Mn0.055As show 1.5-3.0 times higher degree of oxidation on the film surface than that of the as-grown sample. These experimental findings are attributed to the diffusion of Mn impurity atoms from interstitial positions in the GaAs host lattice to the surface where they are passivated by oxygen.

Original languageEnglish
Article number076215
JournalJournal of Physics Condensed Matter
Volume19
Issue number7
DOIs
StatePublished - 2007.02.14

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