Pulse Current Generator with Improved Waveform Fidelity for High Voltage Capacitively-Coupled Plasma System

Beomseok Chae; Juhwa Min; Yongsug Suh; Hyejin Kim; Hyunbae Kim

doi:10.1109/ECCE.2018.8558425

Pulse Current Generator with Improved Waveform Fidelity for High Voltage Capacitively-Coupled Plasma System

Beomseok Chae
, Juhwa Min
, Yongsug Suh
, Hyejin Kim
, Hyunbae Kim

Department of Electrical Engineering

Jeonbuk National University
Samsung

Research output: Contribution to conference › Conference paper › peer-review

3 Scopus citations

Abstract

This proposes a novel structure of power converter solution on the basis of current source type topology for a highly capacitively-coupled plasma application system. In overall system, two current sources are connected in parallel to generate the different output current of high precision in different switching intervals. The overall system consists of four major functional blocks; bias current generator, bias current modulator, slope current generator, and slope current modulator. The proposed solution also employs SiC MOSFET type power semiconductor switch of 1200V/90A in order to meet the fast transient requirement. The proposed converter system successfully satisfies the specification of output voltage of 4.5kV and output current of 40A with the rising/falling time of less than 100ns. This proposed topology makes it possible to accurately shape the output load voltage in a highly capacitively-coupled plasma application system with reduced level of voltage spike and distortion as compared to the state-of-the-arts solutions of voltage source type converters.

Original language	English
Title of host publication	2018 IEEE Energy Conversion Congress and Exposition, ECCE 2018
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	7179-7185
Number of pages	7
ISBN (Electronic)	9781479973118
DOIs	https://doi.org/10.1109/ECCE.2018.8558425
State	Published - 2018.12.3
Event	10th Annual IEEE Energy Conversion Congress and Exposition, ECCE 2018 - Portland, United States Duration: 2018.09.23 → 2018.09.27

Publication series

Name	2018 IEEE Energy Conversion Congress and Exposition, ECCE 2018

Conference

Conference	10th Annual IEEE Energy Conversion Congress and Exposition, ECCE 2018
Country/Territory	United States
City	Portland
Period	18.09.23 → 18.09.27

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 7 Affordable and Clean Energy

Keywords

Capacitively coupled plasma
Current source converter
Plasma power supply
Pulse power supply

Quacquarelli Symonds(QS) Subject Topics

Computer Science & Information Systems
Mathematics
Engineering - Electrical & Electronic
Engineering - Petroleum

Access to Document

10.1109/ECCE.2018.8558425

Cite this

Chae, B., Min, J., Suh, Y., Kim, H., & Kim, H. (2018). Pulse Current Generator with Improved Waveform Fidelity for High Voltage Capacitively-Coupled Plasma System. In 2018 IEEE Energy Conversion Congress and Exposition, ECCE 2018 (pp. 7179-7185). Article 8558425 (2018 IEEE Energy Conversion Congress and Exposition, ECCE 2018). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/ECCE.2018.8558425

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title = "Pulse Current Generator with Improved Waveform Fidelity for High Voltage Capacitively-Coupled Plasma System",

abstract = "This proposes a novel structure of power converter solution on the basis of current source type topology for a highly capacitively-coupled plasma application system. In overall system, two current sources are connected in parallel to generate the different output current of high precision in different switching intervals. The overall system consists of four major functional blocks; bias current generator, bias current modulator, slope current generator, and slope current modulator. The proposed solution also employs SiC MOSFET type power semiconductor switch of 1200V/90A in order to meet the fast transient requirement. The proposed converter system successfully satisfies the specification of output voltage of 4.5kV and output current of 40A with the rising/falling time of less than 100ns. This proposed topology makes it possible to accurately shape the output load voltage in a highly capacitively-coupled plasma application system with reduced level of voltage spike and distortion as compared to the state-of-the-arts solutions of voltage source type converters.",

keywords = "Capacitively coupled plasma, Current source converter, Plasma power supply, Pulse power supply",

author = "Beomseok Chae and Juhwa Min and Yongsug Suh and Hyejin Kim and Hyunbae Kim",

note = "Publisher Copyright: {\textcopyright} 2018 IEEE.; 10th Annual IEEE Energy Conversion Congress and Exposition, ECCE 2018 ; Conference date: 23-09-2018 Through 27-09-2018",

year = "2018",

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doi = "10.1109/ECCE.2018.8558425",

language = "English",

series = "2018 IEEE Energy Conversion Congress and Exposition, ECCE 2018",

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}

Chae, B, Min, J, Suh, Y, Kim, H & Kim, H 2018, Pulse Current Generator with Improved Waveform Fidelity for High Voltage Capacitively-Coupled Plasma System. in 2018 IEEE Energy Conversion Congress and Exposition, ECCE 2018., 8558425, 2018 IEEE Energy Conversion Congress and Exposition, ECCE 2018, Institute of Electrical and Electronics Engineers Inc., pp. 7179-7185, 10th Annual IEEE Energy Conversion Congress and Exposition, ECCE 2018, Portland, United States, 18.09.23. https://doi.org/10.1109/ECCE.2018.8558425

Pulse Current Generator with Improved Waveform Fidelity for High Voltage Capacitively-Coupled Plasma System. / Chae, Beomseok; Min, Juhwa; Suh, Yongsug et al.
2018 IEEE Energy Conversion Congress and Exposition, ECCE 2018. Institute of Electrical and Electronics Engineers Inc., 2018. p. 7179-7185 8558425 (2018 IEEE Energy Conversion Congress and Exposition, ECCE 2018).

Research output: Contribution to conference › Conference paper › peer-review

TY - GEN

T1 - Pulse Current Generator with Improved Waveform Fidelity for High Voltage Capacitively-Coupled Plasma System

AU - Chae, Beomseok

AU - Min, Juhwa

AU - Suh, Yongsug

AU - Kim, Hyejin

AU - Kim, Hyunbae

PY - 2018/12/3

Y1 - 2018/12/3

N2 - This proposes a novel structure of power converter solution on the basis of current source type topology for a highly capacitively-coupled plasma application system. In overall system, two current sources are connected in parallel to generate the different output current of high precision in different switching intervals. The overall system consists of four major functional blocks; bias current generator, bias current modulator, slope current generator, and slope current modulator. The proposed solution also employs SiC MOSFET type power semiconductor switch of 1200V/90A in order to meet the fast transient requirement. The proposed converter system successfully satisfies the specification of output voltage of 4.5kV and output current of 40A with the rising/falling time of less than 100ns. This proposed topology makes it possible to accurately shape the output load voltage in a highly capacitively-coupled plasma application system with reduced level of voltage spike and distortion as compared to the state-of-the-arts solutions of voltage source type converters.

AB - This proposes a novel structure of power converter solution on the basis of current source type topology for a highly capacitively-coupled plasma application system. In overall system, two current sources are connected in parallel to generate the different output current of high precision in different switching intervals. The overall system consists of four major functional blocks; bias current generator, bias current modulator, slope current generator, and slope current modulator. The proposed solution also employs SiC MOSFET type power semiconductor switch of 1200V/90A in order to meet the fast transient requirement. The proposed converter system successfully satisfies the specification of output voltage of 4.5kV and output current of 40A with the rising/falling time of less than 100ns. This proposed topology makes it possible to accurately shape the output load voltage in a highly capacitively-coupled plasma application system with reduced level of voltage spike and distortion as compared to the state-of-the-arts solutions of voltage source type converters.

KW - Capacitively coupled plasma

KW - Current source converter

KW - Plasma power supply

KW - Pulse power supply

UR - https://www.scopus.com/pages/publications/85060311969

U2 - 10.1109/ECCE.2018.8558425

DO - 10.1109/ECCE.2018.8558425

M3 - Conference paper

AN - SCOPUS:85060311969

T3 - 2018 IEEE Energy Conversion Congress and Exposition, ECCE 2018

SP - 7179

EP - 7185

BT - 2018 IEEE Energy Conversion Congress and Exposition, ECCE 2018

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 10th Annual IEEE Energy Conversion Congress and Exposition, ECCE 2018

Y2 - 23 September 2018 through 27 September 2018

ER -

Chae B, Min J, Suh Y, Kim H, Kim H. Pulse Current Generator with Improved Waveform Fidelity for High Voltage Capacitively-Coupled Plasma System. In 2018 IEEE Energy Conversion Congress and Exposition, ECCE 2018. Institute of Electrical and Electronics Engineers Inc. 2018. p. 7179-7185. 8558425. (2018 IEEE Energy Conversion Congress and Exposition, ECCE 2018). doi: 10.1109/ECCE.2018.8558425

Pulse Current Generator with Improved Waveform Fidelity for High Voltage Capacitively-Coupled Plasma System

Abstract

Publication series

Conference

UN SDGs

Keywords

Quacquarelli Symonds(QS) Subject Topics

Access to Document

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Cite this