Pulsed power technology and its applications at EDI, Nagaoka

Recent activities of pulsed power technology and its applications are overviewed. Using high density ablation plasma inherent to short range of ion beam in targets, we have successfully prepared crystallized thin film of B ₄C by ion beam evaporation, which is characterized by hardness, wear resistant, and stability at high temperature. Fullerenes have been prepared as well. Ultrafine nanosize powders have been synthesized by pulsed wire discharge. Flue gas treatment of NO _x has been succeeded by intense pulsed relativistic electron beam. Foil acceleration has been observed to be ∼ 8 km/s with the ablation pressure of 13 GPa. Pulsed laser deposition was used to prepare (Cr _1∼x,Al _x)N films. The AlN solubility limit was found to be 77 at.% AlN. The hardness of the films increases with x up to 0.75, and decreases rapidly due to the presence of amorphous structure. Highly repetitive, new pulsed power generator has been operational, with the specifications of 400 kV, 13 kA, 120 ns, 1 pps.