Quick preparation of thin films and nanosize powders by high-density ablation plasma produced by intense pulsed ion beam

Using high density ablation plasma produced by the intense pulsed ion beam interaction with solid targets, we have successfully prepared various kinds of thin films and ultrafine nanosize powders, which was named pulsed ion beam evaporation (IBE). Very quick and stoichiometric preparation is available by high density ablation plasma (density ∼ 10¹⁹ cm^-3) in good vacuum, without heating substrate, and without post-annealing. Since we reported the preparation of thin films after the first demonstration in 1988, we only discuss the preparation of B₄C films in this paper. We believe this is the first demonstration in the world. As well known, B₄C is very hard after diamond, wear resistant, and stable at high temperature. The experiment was carded out by the intense pulsed proton beam interaction with B₄C target. From various diagnostics by XRD, FT-IR, FE-SEM, TEM, EELS, and Vickers hardness, we have confirmed the successful preparation of crystallized B₄C films as deposited. Absorptions associated with B-C bond have been clearly observed. In addition to a conventional front-side deposition, where a substrate is placed in front of the target, the preparation has been successful in back-side or mask-side configuration. Here, the substrate was placed in the rear of the target holder or masked by the holder so that the primary ablation plume directly cannot arrive at the substrate. Good morphology has been observed on the surface of the films prepared. The maximum Vickers harness has been achieved to 2,300.