Abstract
We have investigated the re?ow behavior of phosphorus silicate glass (PSG) layer formed on textured Si surface using transmission electron microscopy and simulation. For conventional wet oxidation process, stress-dependent surface reaction and stress-dependent oxidant diffusion led to the oxidation retardation in both convex and concave regions of the textured Si surface, respectively. However, PSG ?lm formed by POCl 3-diffusion underwent re?ow, resulting in the formations of thinner and thicker PSG ?lms in convex and concave regions, respectively. Simulation results showed that the re?ow of PSG ?lms causes lateral thermal mismatch stresses to increase and decrease in convex and concave regions, respectively.
| Original language | English |
|---|---|
| Pages (from-to) | 5700-5703 |
| Number of pages | 4 |
| Journal | Journal of nanoscience and nanotechnology |
| Volume | 12 |
| Issue number | 7 |
| DOIs | |
| State | Published - 2012.07 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 7 Affordable and Clean Energy
Keywords
- Phosphorus Silicate Glass
- PoCl
- Re?ow
- Solar Cell
- Textured Si
Quacquarelli Symonds(QS) Subject Topics
- Materials Science
- Engineering - Chemical
- Chemistry
- Physics & Astronomy
- Biological Sciences
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