| Original language | Korean |
|---|---|
| Journal | Journal of Semiconductor Technology and Science |
| State | Published - 2014.12.1 |
Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver
Selective Chemical Wet Etching of Si0.8Ge0.2/SiMultilayer
Research output: Contribution to journal › Journal article › peer-review