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Separate extraction of source, drain, and substrate resistances in MOSFETs with parasitic junction current method

  • Hagyoul Bae*
  • , Seok Cheon Baek
  • , Sunyeong Lee
  • , Jaeman Jang
  • , Ja Sun Shin
  • , Daeyoun Yun
  • , Hyojong Kim
  • , Dae Hwan Kim
  • , Dong Myong Kim
  • *Corresponding author for this work
  • Kookmin University

Research output: Contribution to journalJournal articlepeer-review

Abstract

The separate extraction of asymmetric source (RS) and drain (RRD) resistances caused by the variations in the layout, process, and device degradation is important in the practical modeling and characterization of MOSFETs and their integrated circuits. We propose a simple parasitic junction current method (PJCM) for the separate extraction of R S, RD, and RSUB (substrate resistance) in MOSFETs. We applied the proposed PJCM to n-channel MOSFETs with different W/L combinations and verified its usefulness in the robust extraction of R S, RD, and RSUB.

Original languageEnglish
Article number5582196
Pages (from-to)1190-1192
Number of pages3
JournalIEEE Electron Device Letters
Volume31
Issue number11
DOIs
StatePublished - 2010.11

Keywords

  • Drain resistance
  • MOSFET
  • parameter extraction
  • parasitic junction
  • parasitic resistance
  • source resistance
  • substrate resistance

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