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Spatial distribution of defects generated by hyperthermal Ar+ impact onto graphite

  • J. R. Hahn*
  • , H. Kang
  • *Corresponding author for this work
  • Pohang University of Science and Technology

Research output: Contribution to journalJournal articlepeer-review

Abstract

We report the spatial distribution of defects generated by low energy (50-500 eV) impact of Ar+ ions onto a graphite surface. By using scanning tunneling microscopy and O2 oxidative etching, the vertical distribution of ion-induced defects is measured. The threshold energy is determined for ion penetration into each of graphite layers. The lateral range of Ar travel in interlayer space is measured from pair correlation analysis of carbon vacancies and Ar interstitials.

Original languageEnglish
Pages (from-to)L77-L82
JournalSurface Science
Volume446
Issue number1-2
DOIs
StatePublished - 2000.02.1

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