Abstract
We report the spatial distribution of defects generated by low energy (50-500 eV) impact of Ar+ ions onto a graphite surface. By using scanning tunneling microscopy and O2 oxidative etching, the vertical distribution of ion-induced defects is measured. The threshold energy is determined for ion penetration into each of graphite layers. The lateral range of Ar travel in interlayer space is measured from pair correlation analysis of carbon vacancies and Ar interstitials.
| Original language | English |
|---|---|
| Pages (from-to) | L77-L82 |
| Journal | Surface Science |
| Volume | 446 |
| Issue number | 1-2 |
| DOIs | |
| State | Published - 2000.02.1 |
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