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Spectroscopic evidence for limited carrier hopping interaction in amorphous ZnO thin film

  • Deok Yong Cho*
  • , Jeong Hwan Kim
  • , Kwang Duk Na
  • , Jaewon Song
  • , Cheol Seong Hwang
  • , Byeong Gyu Park
  • , Jae Young Kim
  • , Chul Hee Min
  • , Se Jung Oh
  • *Corresponding author for this work
  • Sungkyunkwan University
  • Seoul National University
  • Pohang University of Science and Technology

Research output: Contribution to journalJournal articlepeer-review

Abstract

The electronic structure of amorphous ZnO film (a-ZnO) was examined by O K- and Zn L3-edge x-ray absorption spectroscopy and valence band photoemission spectroscopy. Comparative studies of a -ZnO and a wurtzite ZnO (w -ZnO) revealed a decrease in Zn 4s-O 2p hybridization strength and the localization of Zn 4s band as a consequence of local structural disorder, indicating limited electron hopping interactions in a -ZnO. The 0.1 eV higher Fermi-level of a -ZnO compared to w -ZnO suggests that the electrical properties of a -ZnO are different from those in w -ZnO due to structural disorder, even in the absence of impurities or grain boundaries.

Original languageEnglish
Article number261903
JournalApplied Physics Letters
Volume95
Issue number26
DOIs
StatePublished - 2009

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