Sputter deposited p-type nickel oxide thin films as an anode buffer layer in organic solar cells

Dong Ho Kim; Jae Wook Kang; Hye Ri Kim; Yong Jin Kang; Sun Young Park; Yong Soo Jeong

doi:10.1109/PVSC.2011.6186164

Sputter deposited p-type nickel oxide thin films as an anode buffer layer in organic solar cells

Dong Ho Kim^*
, Jae Wook Kang
, Hye Ri Kim
, Yong Jin Kang
, Sun Young Park
, Yong Soo Jeong

^*Corresponding author for this work

Department of Flexible and Printable Electronics

Korea Institute of Materials Science

Research output: Contribution to conference › Conference paper › peer-review

Abstract

P-type NiO thin films were prepared by magnetron sputtering and their characteristic properties were investigated with varying oxygen gas ratio in sputtering ambient. From the measurements of Hall effect and Seebeck coefficient, the films were confirmed to be of p-type conduction. NiO films were applied as the anode buffer layer between ITO and active layer in organic solar cells. Effects of the buffer NiO film on the device performance were systematically studied in this work.

Original language	English
Title of host publication	Program - 37th IEEE Photovoltaic Specialists Conference, PVSC 2011
Pages	1173-1175
Number of pages	3
DOIs	https://doi.org/10.1109/PVSC.2011.6186164
State	Published - 2011
Event	37th IEEE Photovoltaic Specialists Conference, PVSC 2011 - Seattle, WA, United States Duration: 2011.06.19 → 2011.06.24

Publication series

Name	Conference Record of the IEEE Photovoltaic Specialists Conference
ISSN (Print)	0160-8371

Conference

Conference	37th IEEE Photovoltaic Specialists Conference, PVSC 2011
Country/Territory	United States
City	Seattle, WA
Period	11.06.19 → 11.06.24

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 7 Affordable and Clean Energy

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10.1109/PVSC.2011.6186164

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Kim, D. H., Kang, J. W., Kim, H. R., Kang, Y. J., Park, S. Y., & Jeong, Y. S. (2011). Sputter deposited p-type nickel oxide thin films as an anode buffer layer in organic solar cells. In Program - 37th IEEE Photovoltaic Specialists Conference, PVSC 2011 (pp. 1173-1175). Article 6186164 (Conference Record of the IEEE Photovoltaic Specialists Conference). https://doi.org/10.1109/PVSC.2011.6186164

@inproceedings{1e41d87fc1974974932b9dd2e0752f3e,

title = "Sputter deposited p-type nickel oxide thin films as an anode buffer layer in organic solar cells",

abstract = "P-type NiO thin films were prepared by magnetron sputtering and their characteristic properties were investigated with varying oxygen gas ratio in sputtering ambient. From the measurements of Hall effect and Seebeck coefficient, the films were confirmed to be of p-type conduction. NiO films were applied as the anode buffer layer between ITO and active layer in organic solar cells. Effects of the buffer NiO film on the device performance were systematically studied in this work.",

author = "Kim, \{Dong Ho\} and Kang, \{Jae Wook\} and Kim, \{Hye Ri\} and Kang, \{Yong Jin\} and Park, \{Sun Young\} and Jeong, \{Yong Soo\}",

year = "2011",

doi = "10.1109/PVSC.2011.6186164",

language = "English",

isbn = "9781424499656",

series = "Conference Record of the IEEE Photovoltaic Specialists Conference",

pages = "1173--1175",

booktitle = "Program - 37th IEEE Photovoltaic Specialists Conference, PVSC 2011",

note = "37th IEEE Photovoltaic Specialists Conference, PVSC 2011 ; Conference date: 19-06-2011 Through 24-06-2011",

}

Kim, DH, Kang, JW, Kim, HR, Kang, YJ, Park, SY & Jeong, YS 2011, Sputter deposited p-type nickel oxide thin films as an anode buffer layer in organic solar cells. in Program - 37th IEEE Photovoltaic Specialists Conference, PVSC 2011., 6186164, Conference Record of the IEEE Photovoltaic Specialists Conference, pp. 1173-1175, 37th IEEE Photovoltaic Specialists Conference, PVSC 2011, Seattle, WA, United States, 11.06.19. https://doi.org/10.1109/PVSC.2011.6186164

Sputter deposited p-type nickel oxide thin films as an anode buffer layer in organic solar cells. / Kim, Dong Ho; Kang, Jae Wook; Kim, Hye Ri et al.
Program - 37th IEEE Photovoltaic Specialists Conference, PVSC 2011. 2011. p. 1173-1175 6186164 (Conference Record of the IEEE Photovoltaic Specialists Conference).

Research output: Contribution to conference › Conference paper › peer-review

TY - GEN

T1 - Sputter deposited p-type nickel oxide thin films as an anode buffer layer in organic solar cells

AU - Kim, Dong Ho

AU - Kang, Jae Wook

AU - Kim, Hye Ri

AU - Kang, Yong Jin

AU - Park, Sun Young

AU - Jeong, Yong Soo

PY - 2011

Y1 - 2011

N2 - P-type NiO thin films were prepared by magnetron sputtering and their characteristic properties were investigated with varying oxygen gas ratio in sputtering ambient. From the measurements of Hall effect and Seebeck coefficient, the films were confirmed to be of p-type conduction. NiO films were applied as the anode buffer layer between ITO and active layer in organic solar cells. Effects of the buffer NiO film on the device performance were systematically studied in this work.

AB - P-type NiO thin films were prepared by magnetron sputtering and their characteristic properties were investigated with varying oxygen gas ratio in sputtering ambient. From the measurements of Hall effect and Seebeck coefficient, the films were confirmed to be of p-type conduction. NiO films were applied as the anode buffer layer between ITO and active layer in organic solar cells. Effects of the buffer NiO film on the device performance were systematically studied in this work.

UR - https://www.scopus.com/pages/publications/84861053916

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DO - 10.1109/PVSC.2011.6186164

M3 - Conference paper

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SN - 9781424499656

T3 - Conference Record of the IEEE Photovoltaic Specialists Conference

SP - 1173

EP - 1175

BT - Program - 37th IEEE Photovoltaic Specialists Conference, PVSC 2011

T2 - 37th IEEE Photovoltaic Specialists Conference, PVSC 2011

Y2 - 19 June 2011 through 24 June 2011

ER -

Sputter deposited p-type nickel oxide thin films as an anode buffer layer in organic solar cells

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