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STM study of Ar+-induced defects produced by near-threshold energy collision

  • J. R. Hahn
  • , H. Kang*
  • *Corresponding author for this work
  • Pohang University of Science and Technology

Research output: Contribution to journalJournal articlepeer-review

Abstract

We have investigated graphite surfaces impacted with Ar+ ions of near-threshold energies (40-100 eV) using STM. In order to understand the effect of Ar atoms trapped between the graphite basal planes on STM image, the trapped atoms are evaporated by heating the surface at 600°C after 50 eV Ar+ impact. Ion impact creates hillocks of various size in STM images, which originate from the enhanced charge density at vacancy and interstitial defect sites. The yields for total defect production, vacancy production and Ar trapping upon ion impact are determined at an energy of 50-100 eV. The threshold energies for vacancy production and trapping are deduced from these data.

Original languageEnglish
Pages (from-to)165-169
Number of pages5
JournalSurface Science
Volume357-358
DOIs
StatePublished - 1996.06.20

Keywords

  • Graphite
  • Ion bombardment
  • Scanning tunneling microscopy
  • Surface defects

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