Stress-induced self-rolled metal/insulator bifilm microtube with micromesh walls

A metal/insulator microtube with micromesh walls was constructed using stress-assisted self-rolling technology. The mesh-sidewall Pt/Ti/SiO₂ microtube was self-formed by a tensile-stressed metal Pt/Ti film deposited onto a pre-patterned SiO₂ micromesh layer. The microtube measured about 25 μm in diameter and was longer than 7 mm. The sidewall of the microtube was a square mesh, 5-20 μm long, and was electrically connected to electrical pads for electrical conductance measurement. The electrical resistance of the rolled-up microtube was measured to be 250-350 Ω when the microtube resistor's length was around 540 μm. The real-time measurement of the conductance change of the microtube with a Pt resistor could monitor the temperature change generated by heat injection. The microtube with micromesh walls is expected to be an interesting structure that has promising potential for use in electronics, chemical and biological applications.