Structural and electrical properties of radio frequencymagnetron sputtered tantalum oxide films: Influenceof post-deposition annealing

Research output: Contribution to journal › Journal article › peer-review

Original language	Korean
Journal	Materials Science in Semiconductor Processing
State	Published - 2010.12.31

Cite this

@article{580a052c280a4e91a437a24393cc1acf,

title = "Structural and electrical properties of radio frequencymagnetron sputtered tantalum oxide films: Influenceof post-deposition annealing",

author = "Chel-Jong Choi",

year = "2010",

month = dec,

day = "31",

language = "Korean",

journal = "Materials Science in Semiconductor Processing",

issn = "1369-8001",

}