Structural and electrical properties of ZnO nanorods and Ti buffer layers

  • C. H. Kwak
  • , B. H. Kim
  • , C. I. Park
  • , S. Y. Seo
  • , S. H. Kim
  • , S. W. Han*
  • *Corresponding author for this work

Research output: Contribution to journalJournal articlepeer-review

Abstract

Vertically-well-aligned ZnO nanorods were synthesized on Ti buffer layers by a metal-organic chemical-vapor deposition process. Structural analyses demonstrated that the ZnO nanorods were well-aligned in the c -axis and ab -plane. Transmission electron microscopy (TEM) showed that the Ti buffer layer was amorphous and interdiffused into the ZnO nanorods. Energy-dispersive spectroscopy (EDS) analysis revealed the Ti buffer layers to be slightly oxide. Extended x-ray absorption fine structure confirmed the TEM and EDS results. The I-V characteristic measurements showed a 20-fold increase in current density with the Ti buffer layer, suggesting excellent electrical contact between the Ti buffer layer and ZnO nanorods.

Original languageEnglish
Article number051908
JournalApplied Physics Letters
Volume96
Issue number5
DOIs
StatePublished - 2010

Quacquarelli Symonds(QS) Subject Topics

  • Physics & Astronomy

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