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Structural disorders in an amorphous HfO2 film probed by x-ray absorption fine structure analysis

  • Deok Yong Cho*
  • , Tae Joo Park
  • , Kwang Duk Na
  • , Jeong Hwan Kim
  • , Cheol Seong Hwang
  • *Corresponding author for this work
  • Seoul National University

Research output: Contribution to journalJournal articlepeer-review

Abstract

The local structural order of amorphous HfO2 films (a-HfO 2) was examined using Hf L3-edge x-ray absorption spectroscopy and fine structure analyses. The fine structure simulation successfully reproduced the spectral evolution of the crystalline-to-amorphous phase transition by reducing the characteristic radius for atomic ordering to ∼3.5 Å. Detailed path-by-path analyses further showed that the vibrational displacement of oxygen atoms in a-HfO2 films is highly anisotropic showing mainly lateral dispersion perpendicular to a Hf-O bond. This anisotropic structural disorder is responsible for enhancing the dielectric constant accompanying phonon mode softening in the a-HfO2 film.

Original languageEnglish
Article number132102
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume78
Issue number13
DOIs
StatePublished - 2008.10.22

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