Abstract
This study examined the micro-structural and electrical properties of N +-ion-implanted ZnO nanorods. Nitrogen ions with energies of 10-90 keV and beam fluxes of 10 13-10 16 ions/cm 2 were implanted on vertically-aligned ZnO nanorods. Energy dispersive X-ray spectroscopy measurements showed that N ions were spread uniformly over the nanorods. Extended X-ray absorption fine structure measurements revealed that the implanted N +s had partially substituted for the oxygen sites. Photoluminescence measurements showed a neutral-donor bound exciton peak at 3.36 eV and a two-electron-satellite peak at 3.33 eV independent of the ion energy and flux. The I-V characteristic curves showed that the current density was not changed by the N + ion energy and flux much. These results strongly suggested that the N ions substituted for the oxygen sites were neutral.
| Original language | English |
|---|---|
| Pages (from-to) | 7420-7423 |
| Number of pages | 4 |
| Journal | Journal of nanoscience and nanotechnology |
| Volume | 11 |
| Issue number | 8 |
| DOIs | |
| State | Published - 2011.08 |
Keywords
- EXAFS
- I-V
- Ion implantation
- Nanorod
- Photoluminescence
- Structure
- ZnO
Quacquarelli Symonds(QS) Subject Topics
- Materials Science
- Engineering - Chemical
- Chemistry
- Physics & Astronomy
- Biological Sciences
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