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Surface-potential-based analytic DC I-V model with effective electron density for a-IGZO TFTS considering the parasitic resistance

  • Jun Hyun Park*
  • , Yongsik Kim
  • , Sungchul Kim
  • , Hagyoul Bae
  • , Dae Hwan Kim
  • , Dong Myong Kim
  • *Corresponding author for this work
  • Kookmin University

Research output: Contribution to journalJournal articlepeer-review

Abstract

A surface-potential-based analytic direct-current I-V model for amorphous indium-gallium-zinc-oxide thin-film transistors is proposed by adopting an effective electron density (n\rm eff}) model for inclusion of both free carriers and localized charges in the channel. The proposed n \rm eff is efficient in reducing the error caused by neglecting the localized electron density n\rm loc and allows a closed form of the analytic I-V model. The potential drop across the parasitic resistance R P in the source and drain regions is also fully considered in the model. Finally, we confirmed good agreement of the proposed model with measured I\rm DS-V\rm DS characteristics over a wide range of V\rm GS and V\rm DS.

Original languageEnglish
Article number6029283
Pages (from-to)1540-1542
Number of pages3
JournalIEEE Electron Device Letters
Volume32
Issue number11
DOIs
StatePublished - 2011.11

Keywords

  • Amorphous
  • Analytic model
  • Effective density
  • I-V model
  • Indium-gallium-zinc-oxide (IGZO)
  • Parasitic resistance
  • Thin-film transistor (TFT)

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