Abstract
A surface-potential-based analytic direct-current I-V model for amorphous indium-gallium-zinc-oxide thin-film transistors is proposed by adopting an effective electron density (n\rm eff}) model for inclusion of both free carriers and localized charges in the channel. The proposed n \rm eff is efficient in reducing the error caused by neglecting the localized electron density n\rm loc and allows a closed form of the analytic I-V model. The potential drop across the parasitic resistance R P in the source and drain regions is also fully considered in the model. Finally, we confirmed good agreement of the proposed model with measured I\rm DS-V\rm DS characteristics over a wide range of V\rm GS and V\rm DS.
| Original language | English |
|---|---|
| Article number | 6029283 |
| Pages (from-to) | 1540-1542 |
| Number of pages | 3 |
| Journal | IEEE Electron Device Letters |
| Volume | 32 |
| Issue number | 11 |
| DOIs | |
| State | Published - 2011.11 |
Keywords
- Amorphous
- Analytic model
- Effective density
- I-V model
- Indium-gallium-zinc-oxide (IGZO)
- Parasitic resistance
- Thin-film transistor (TFT)
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