Tailoring Interlayer Coupling in Few-Layer MoS2 with Stacking Configuration

  • Jong Hun Kim
  • , Kyung Hwan Jin
  • , Yeonjoon Jung
  • , Gwan Hyoung Lee
  • , Jaeyoon Baik
  • , Daehyun Kim
  • , Moon Ho Jo
  • , Arthur P. Baddorf
  • , An Ping Li
  • , Jewook Park*
  • *Corresponding author for this work

Research output: Contribution to journalJournal articlepeer-review

Abstract

We manipulated the stacking configuration of a few-layer MoS2 to investigate the impact of interlayer coupling on electrical band engineering. By simultaneously synthesizing two distinct stacking types of MoS2 islands, wedding cake (W) and spiral (S), on the same substrate, we explored layer-dependent electrical properties under identical experimental conditions. We used multiple scanning probe microscopy techniques to map local electronic properties with respect to the number of layers, stacking configurations, and local heterogeneities. First-principles calculations verified the role of distinct interlayer coupling in terms of the interlayer distance. Our findings highlight the critical role of interlayer coupling in applications of transition metal dichalcogenides.

Original languageEnglish
Pages (from-to)17214-17220
Number of pages7
JournalACS Applied Nano Materials
Volume7
Issue number15
DOIs
StatePublished - 2024.08.9

Keywords

  • density functional theory
  • electrical bandgap
  • Interlayer coupling
  • Kelvin probe microscopy
  • local density of states
  • scanning tunneling microscopy and spectroscopy
  • transition metal dichalcogenides

Quacquarelli Symonds(QS) Subject Topics

  • Materials Science

Fingerprint

Dive into the research topics of 'Tailoring Interlayer Coupling in Few-Layer MoS2 with Stacking Configuration'. Together they form a unique fingerprint.

Cite this