The effect of gas composition on the properties of silicon oxynitride thin film prepared by low-pressure inductively coupled Ar/N2 plasma
- Woojin Park
- , Jonggu Han
- , Jongsik Kim
- , Se Youn Moon*
*Corresponding author for this work
- Jeonbuk National University
- National Fusion Research Institute
Research output: Contribution to journal › Journal article › peer-review
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