Abstract
In order to investigate the effect of tail state on the electrical and the optical properties in amorphous IGZO(a-IGZO), a-IGZO films were deposited at room temperature on fused silica substrats using pulsed laser deposition method. The laser pulse energy was used as the processing parameter. In-situ post annealing was carried out at 150°C right after the film deposition. The O2 partial pressure during the deposition and the post annealing was fixed to 10m Torr. The carrier mobility of the a-IGZO films had a range from 2 to 18 cm2 /Vs at carrier concentrations greater than 1018 cm-3 . As the laser energy density increased, the Hall mobility increased. And post annealing improved the Hall mobility, as well. The optical property was examined using the ultraviolet-visible spectroscopy. The aIGZO films that have low Hall mobility exhibited stronger and broader absorption tails in >3.0 eV region. Post annealing reduced the intensity of the tail-like absorption. The absorption tail in a-IGZO films is an important factor which affects the electrical and the optical properties.
| Original language | English |
|---|---|
| Pages (from-to) | 329-332 |
| Number of pages | 4 |
| Journal | Journal of the Korean Ceramic Society |
| Volume | 47 |
| Issue number | 4 |
| DOIs | |
| State | Published - 2010.07.31 |
Keywords
- Absorption tail
- Amorphous oxide semiconductor
- IGZO
- Thin film transistor
Quacquarelli Symonds(QS) Subject Topics
- Materials Science
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