Abstract
The influence of structural disorder on the electronic structure of amorphous ZnSnO3 was examined by ab-initio calculations. The calculation results are compared with the experimental results using as-deposited and annealed ZnSnO3 films grown by atomic layer deposition. The O K-edge X-ray absorption spectroscopy, X-ray diffraction, and thin-film transistors were employed in the experiment. The conduction band minima of amorphous and crystalline ZnSnO3 mainly consisted of Sn 5s state, while a higher non-uniform localization of these states was observed in the amorphous phase compared with the crystalline counterpart. The experimental results coincide well with the theoretical results.
| Original language | English |
|---|---|
| Article number | 242111 |
| Journal | Applied Physics Letters |
| Volume | 102 |
| Issue number | 24 |
| DOIs | |
| State | Published - 2013.06.17 |
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