Abstract
A two-phase boosted voltage (VPP) generator circuit was proposed for use in gigabit DRAMs. It reduced the maximum gate-oxide voltage of pass transistor and the lower limit of supply voltage to VPP and VTN, respectively, while those for the conventional charge-pump circuit are VPP + VDD and 1.5 VTN respectively. Also, the pumping current was increased in the new circuit. The newly proposed two-phase VPP charge-pump circuit worked successfully at V DD down to 0.8 V by eliminating the threshold voltage loss of the control pulse generator and was tested successfully in a 0.16-μm test chip using triple-well CMOS technology.
| Original language | English |
|---|---|
| Pages (from-to) | 1726-1729 |
| Number of pages | 4 |
| Journal | IEEE Journal of Solid-State Circuits |
| Volume | 38 |
| Issue number | 10 |
| DOIs | |
| State | Published - 2003.10 |
Keywords
- Boosted
- Charge pump
- Gigabit DRAMs
- Low voltage
- Voltage generator
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