UV-Shielding TiO2 thin film deposition on flexible and heat-labile substrate using an open-air hybrid CVD/Plasma method

Rodolphe Mauchauffé; Jongwoon Kim; Dong hyun Kim; Sangwon Lee; Minserk Kwon; Se Youn Moon

doi:10.1016/j.vacuum.2021.110424

UV-Shielding TiO₂ thin film deposition on flexible and heat-labile substrate using an open-air hybrid CVD/Plasma method

Rodolphe Mauchauffé
, Jongwoon Kim
, Dong hyun Kim
, Sangwon Lee
, Minserk Kwon
, Se Youn Moon^*

^*Corresponding author for this work

Department of Quantum System Engineering

Research output: Contribution to journal › Journal article › peer-review

10 Scopus citations

Abstract

In this work, compact scratch resistant transparent amorphous TiO₂ thin films are deposited at low temperature, i.e. as low as 50 °C, by a scalable hybrid method combining atmospheric pressure chemical vapor deposition and plasma treatment in open air. Thin film morphology, chemical composition and scratch resistance properties are investigated. The role of the plasma in the process is investigated through comparison with coatings deposited without plasma ignition. The versatile method enables film deposition on polymer film and shows good UV protection. This method, operating in open air shows promising results for the simple, large scale deposition of low carbon containing transparent TiO₂ coatings at low temperature.

Original language	English
Article number	110424
Journal	Vacuum
Volume	192
DOIs	https://doi.org/10.1016/j.vacuum.2021.110424
State	Published - 2021.10

Keywords

Atmospheric pressure plasma
Chemical vapor deposition
Titanium dioxide
UV-Protective thin films

Quacquarelli Symonds(QS) Subject Topics

Materials Science
Physics & Astronomy

Access to Document

10.1016/j.vacuum.2021.110424

Cite this

@article{659bf9c9b4e2422291df6cd1890b126c,

title = "UV-Shielding TiO2 thin film deposition on flexible and heat-labile substrate using an open-air hybrid CVD/Plasma method",

abstract = "In this work, compact scratch resistant transparent amorphous TiO2 thin films are deposited at low temperature, i.e. as low as 50 °C, by a scalable hybrid method combining atmospheric pressure chemical vapor deposition and plasma treatment in open air. Thin film morphology, chemical composition and scratch resistance properties are investigated. The role of the plasma in the process is investigated through comparison with coatings deposited without plasma ignition. The versatile method enables film deposition on polymer film and shows good UV protection. This method, operating in open air shows promising results for the simple, large scale deposition of low carbon containing transparent TiO2 coatings at low temperature.",

keywords = "Atmospheric pressure plasma, Chemical vapor deposition, Titanium dioxide, UV-Protective thin films",

author = "Rodolphe Mauchauff{\'e} and Jongwoon Kim and Kim, \{Dong hyun\} and Sangwon Lee and Minserk Kwon and Moon, \{Se Youn\}",

note = "Publisher Copyright: {\textcopyright} 2021 Elsevier Ltd",

year = "2021",

month = oct,

doi = "10.1016/j.vacuum.2021.110424",

language = "English",

volume = "192",

journal = "Vacuum",

issn = "0042-207X",

}

TY - JOUR

T1 - UV-Shielding TiO2 thin film deposition on flexible and heat-labile substrate using an open-air hybrid CVD/Plasma method

AU - Mauchauffé, Rodolphe

AU - Kim, Jongwoon

AU - Kim, Dong hyun

AU - Lee, Sangwon

AU - Kwon, Minserk

AU - Moon, Se Youn

PY - 2021/10

Y1 - 2021/10

N2 - In this work, compact scratch resistant transparent amorphous TiO2 thin films are deposited at low temperature, i.e. as low as 50 °C, by a scalable hybrid method combining atmospheric pressure chemical vapor deposition and plasma treatment in open air. Thin film morphology, chemical composition and scratch resistance properties are investigated. The role of the plasma in the process is investigated through comparison with coatings deposited without plasma ignition. The versatile method enables film deposition on polymer film and shows good UV protection. This method, operating in open air shows promising results for the simple, large scale deposition of low carbon containing transparent TiO2 coatings at low temperature.

AB - In this work, compact scratch resistant transparent amorphous TiO2 thin films are deposited at low temperature, i.e. as low as 50 °C, by a scalable hybrid method combining atmospheric pressure chemical vapor deposition and plasma treatment in open air. Thin film morphology, chemical composition and scratch resistance properties are investigated. The role of the plasma in the process is investigated through comparison with coatings deposited without plasma ignition. The versatile method enables film deposition on polymer film and shows good UV protection. This method, operating in open air shows promising results for the simple, large scale deposition of low carbon containing transparent TiO2 coatings at low temperature.

KW - Atmospheric pressure plasma

KW - Chemical vapor deposition

KW - Titanium dioxide

KW - UV-Protective thin films

UR - https://www.scopus.com/pages/publications/85109103962

U2 - 10.1016/j.vacuum.2021.110424

DO - 10.1016/j.vacuum.2021.110424

M3 - Journal article

AN - SCOPUS:85109103962

SN - 0042-207X

VL - 192

JO - Vacuum

JF - Vacuum

M1 - 110424

ER -