Wettability Contrast Gravure Printing

Heng Zhang; Alexander Ramm; Sooman Lim; Wei Xie; Bok Yeop Ahn; Wei Chao Xu; Ankit Mahajan; Wieslaw J. Suszynski; Chris Kim; Jennifer A. Lewis; C. Daniel Frisbie; Lorraine F. Francis

doi:10.1002/adma.201502639

Wettability Contrast Gravure Printing

Heng Zhang
, Alexander Ramm
, Sooman Lim
, Wei Xie
, Bok Yeop Ahn
, Wei Chao Xu
, Ankit Mahajan
, Wieslaw J. Suszynski
, Chris Kim
, Jennifer A. Lewis
, C. Daniel Frisbie^*
, Lorraine F. Francis

^*Corresponding author for this work

Department of Flexible and Printable Electronics

University of Minnesota Twin Cities
Harvard University

Research output: Contribution to journal › Journal article › peer-review

30 Scopus citations

Abstract

Silicon gravure patterns are engineered to have cells that are wettable and lands that are not wettable by aqueous inks. This strategy allows excess ink on the lands to be removed without using a doctor blade. Using an aqueous silica ink, continuous lines as narrow as 1.2 μm with 1.5 μm space are gravure printed.

Original language	English
Pages (from-to)	7420-7425
Number of pages	6
Journal	Advanced Materials
Volume	27
Issue number	45
DOIs	https://doi.org/10.1002/adma.201502639
State	Published - 2015.12.2

Keywords

flexible electronics
gravure printing
nanoparticle inks
printing
wettability contrast

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10.1002/adma.201502639

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@article{112d02c8bfcb4350a37a8222f188bd66,

title = "Wettability Contrast Gravure Printing",

abstract = "Silicon gravure patterns are engineered to have cells that are wettable and lands that are not wettable by aqueous inks. This strategy allows excess ink on the lands to be removed without using a doctor blade. Using an aqueous silica ink, continuous lines as narrow as 1.2 μm with 1.5 μm space are gravure printed.",

keywords = "flexible electronics, gravure printing, nanoparticle inks, printing, wettability contrast",

author = "Heng Zhang and Alexander Ramm and Sooman Lim and Wei Xie and Ahn, \{Bok Yeop\} and Xu, \{Wei Chao\} and Ankit Mahajan and Suszynski, \{Wieslaw J.\} and Chris Kim and Lewis, \{Jennifer A.\} and Frisbie, \{C. Daniel\} and Francis, \{Lorraine F.\}",

note = "Publisher Copyright: {\textcopyright} 2015 WILEY-VCH Verlag GmbH \& Co. KGaA, Weinheim.",

year = "2015",

month = dec,

day = "2",

doi = "10.1002/adma.201502639",

language = "English",

volume = "27",

pages = "7420--7425",

journal = "Advanced Materials",

issn = "0935-9648",

number = "45",

}

TY - JOUR

T1 - Wettability Contrast Gravure Printing

AU - Zhang, Heng

AU - Ramm, Alexander

AU - Lim, Sooman

AU - Xie, Wei

AU - Ahn, Bok Yeop

AU - Xu, Wei Chao

AU - Mahajan, Ankit

AU - Suszynski, Wieslaw J.

AU - Kim, Chris

AU - Lewis, Jennifer A.

AU - Frisbie, C. Daniel

AU - Francis, Lorraine F.

PY - 2015/12/2

Y1 - 2015/12/2

N2 - Silicon gravure patterns are engineered to have cells that are wettable and lands that are not wettable by aqueous inks. This strategy allows excess ink on the lands to be removed without using a doctor blade. Using an aqueous silica ink, continuous lines as narrow as 1.2 μm with 1.5 μm space are gravure printed.

AB - Silicon gravure patterns are engineered to have cells that are wettable and lands that are not wettable by aqueous inks. This strategy allows excess ink on the lands to be removed without using a doctor blade. Using an aqueous silica ink, continuous lines as narrow as 1.2 μm with 1.5 μm space are gravure printed.

KW - flexible electronics

KW - gravure printing

KW - nanoparticle inks

KW - printing

KW - wettability contrast

UR - https://www.scopus.com/pages/publications/84949255777

U2 - 10.1002/adma.201502639

DO - 10.1002/adma.201502639

M3 - Journal article

C2 - 26480017

AN - SCOPUS:84949255777

SN - 0935-9648

VL - 27

SP - 7420

EP - 7425

JO - Advanced Materials

JF - Advanced Materials

IS - 45

ER -

Wettability Contrast Gravure Printing

Abstract

Keywords

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