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ZnSe and ZnO film growth by pulsed-laser deposition

  • Y. R. Ryu*
  • , S. Zhu
  • , S. W. Han
  • , H. W. White
  • , P. F. Miceli
  • , H. R. Chandrasekhar
  • *Corresponding author for this work
  • University of Missouri

Research output: Contribution to journalJournal articlepeer-review

Abstract

ZnSe and ZnO films have been deposited on (001) GaAs substrates under different pressures by pulsed-laser deposition (PLD) with a 193 nm laser beam. The ambient pressures were changed from 8 × 10 -6 to 5 × 10 -2 Torr with high-purity argon gas for ZnSe and oxygen gas for ZnO. X-ray diffraction (XRD) measurement was performed on these samples. The FWHM's of X-ray theta-rocking curves for the (004) peaks of ZnSe films were less than 0.5°. X-ray data show that high-quality ZnO films can be also synthesized by PLD.

Original languageEnglish
Pages (from-to)496-499
Number of pages4
JournalApplied Surface Science
Volume127-129
DOIs
StatePublished - 1998.05

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